• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    1. A “UTOPOLYMERIZING COMPOSITION, including an epoxy monomer and a photoinitiator, characterized in that, in order to increase the curing rate, as a photoinitiator, the composition contains a complex salt, where X. F, OB; RI R. |. p t in the following ratio of components1 IfSC..4.l, Epoxy monomer 50-100 Photoinitiator 0.05-0.5 2. The composition according to claim 1, which is specifically that it additionally contains polyethylene. col-400 with a ratio of yin epoxy monomer and polyethyl glycol-400 equal to 1: 1. at
    公开号:SU1178334A3
    申请号:SU792723099
    申请日:1979-02-07
    公开日:1985-09-07
    发明作者:Генри Смит Джордж；Мартин Олофсон Питер
    申请人:Миннесота Майнинг Энд Мануфакчуринг Компани (Фирма)；
    IPC主号:
    专利说明:

    W 1. 11 The invention relates to photopolymerizable compositions that can be used for optical lenses of automobile and boat bodies, molds, cushioning materials of reinforced plastics, protective coatings, resins for casting, compaction or encapsulation of electronic components. The purpose of the invention is to increase the speed of curing of compositions. Examples 1-8. Prepare solutions containing 100 mash. diglycy D-10-ester of B-Uc -phenol (epoxy and monomer DEC of the company Dow Chemical K) and 0.1 wt.h. sulfonate salts (table. 1). Each solution is weighed in 3 forms of carbon black for g; radiation of a sample 0.5 cm thick. 3: the mold is placed under a 275V lamp of sunlight at a distance of 10 cm. After each exposure, each sample is immersed in acetone, measured, are thick. The results are shown in Table. 1. Examples 9-18. Prepare a solution. containing 100 mac. epoxy-3,4-epoxycyclohexylmethyl-3,4-eioxycyclohexenocarboxylate (ERZ 221 of Union Carbide Corp. 0 and 0.1 parts by weight of sulfonium salts listed in Table 2. Each raster was weighed into a mold from black rubber to get a sample 0.5 cm thick. Then the mold is placed under a 275 V sunlight lamp at a distance of 10 cm. Each sample is exposed for 4 minutes and 15 minutes. After curing, the sample is placed in acetone, mixed for 20 minutes, dried, thickness is measured. Data is given in Table 2. Examples 19-24. Formulations containing EPO are prepared. The monomer is diglycidyl ether polypropylene glycol (DEU-736 from DAU Chemical K) and sulfonium salts (see Table 3). The resulting compositions exhibit JB rubber form under a 275 V sunlight at a distance of 10 cm. The data are shown in Table 3. Examples 25-35 Prepared solutions containing 50 yas of 3,4-epoxycyclohexylmethyl-3, 4-epoxycyclohexanecarboxylate (ERZ-4221 of Union Carbide Corp.) and 50 parts by weight of polyethenyl glycol-400. To 20 ma.ch. of this solution, the amount of photoinitiator indicated in Table 2 is added. 4. Samples are poured into a rubber mold with a thickness of 12.7 mm and eke up under a 275 V sunlight lamp at a distance of 10 cm. The results are shown in Table. 4. T a b i c a 1
    C. (), SbFg Az, S SbFg
     () SbF6 C. .S (((Cl
    () 58 sbFe
    (CgH) I SbF) SbF
    five
    five;
    0.2-0.5 0.7-1.0 0.7-1.0 1.0-1.2 1.1-1.2 1.1-1.2
    Sample
    Sulfonium salt as an example
     () 2SbFg
     Sbfg
    Ar, S
    (CgHjSCCgHp SbFgOH (CgHpS, S ((CgH, S (CeH5) BF4 (C, H, -S (C6H5) 2AsF ArjS PFe AsF BF4
    Sulfonium salt
    Ilproiep
     .
     Sbf
     Ar SF
     C, (,) P7
     FFg
     Bf4
    Thickness in mm, on exposure
    gz; 4 min I 1 min
    0 0 0 0 0 0
    Table 3
    Sulfonium salt, ma.ch. Ya 100 ma.ch. epoxide
    5.6 5.6
    0
    0
    0
    0
    T a b l and c a 4
    权利要求:
    Claims (2)
    [1]
    1. PHOTOPOLYMERIZING COMPOSITION, comprising an epoxy monomer and a photoinitiator, 'characterized in that, in order to increase the curing rate, the composition contains as a photoinitiator a complex salt of triarylsulfonium of the general formula where X = F, OH;
    Rr R 4 = n (in the following ratio of components! Parts by weight: ', ·
    Epoxy monomer 50-100 Photoinitiator 0.05-0.5
    [2]
    2. The composition of claim 1, wherein it further comprises polyethylenegly ·· <col-400 with a ratio of epoxy monomer and polyethylene glycol-400 equal to 1: 1.
    类似技术:
    公开号 | 公开日 | 专利标题
    SU1178334A3|1985-09-07|Photopolymerizing composition
    GB1516351A|1978-07-05|Curable epoxide compositions
    CA1114089A|1981-12-08|Photopolymerizable compositions containingepoxy and hydroxyl-containing organic materialsand aromatic iodonium or sulfonium salt photoinitiators
    US4310469A|1982-01-12|Diaryliodonium salts
    US4175972A|1979-11-27|Curable epoxy compositions containing aromatic onium salts and hydroxy compounds
    GB1512981A|1978-06-01|Curable epoxide compositions
    JPS5869244A|1983-04-25|Epoxy resin composition for molding
    US3325439A|1967-06-13|Stabilized self-emulsifying solutions of alkyl poly-siloxanes containing hydrogen linked with silicon
    RU2213748C2|2003-10-10|Composition for flat display panel barrier
    JPS5837003A|1983-03-04|Thermosetting composition
    JPS6121126A|1986-01-29|Ultraviolet-curable resin composition
    JPH01318034A|1989-12-22|Accelerator for epoxide curing agent containing cyanamide
    CA1061158A|1979-08-28|Light sensitive layer containing o-naphthoquinone diazide, resin and aminoalkoxysilane
    JP3566397B2|2004-09-15|Cationic polymerizable organic material composition and method for stabilizing the composition
    JPS56152833A|1981-11-26|Thermosetting composition
    JPS5467000A|1979-05-29|Transparent thermosetting resin composition
    SU798681A1|1981-01-23|Photopolymeric printing plate
    JPS596211A|1984-01-13|Ultraviolet ray-curable composition
    JPH0641215A|1994-02-15|Solution of cation generator
    JPS56106969A|1981-08-25|Transparent abrasion-resistant coating composition
    SU472740A1|1975-06-05|Nonstick coating for casting molds and cores
    JPS6136302A|1986-02-21|Photo-polymerizable composition
    CA1080392A|1980-06-24|Photopolymerizable compositions containing group va aromatic onium salts
    JPS5454199A|1979-04-28|Epoxy resin composition
    SU529195A1|1976-09-25|Epoxy composition
    同族专利:
    公开号 | 公开日
    GB2014144B|1982-07-28|
    AU4402579A|1979-08-16|
    JPS54151936A|1979-11-29|
    DE2904626C2|1989-10-05|
    FR2416884A1|1979-09-07|
    CH640222A5|1983-12-30|
    AU521611B2|1982-04-22|
    DE2904626A1|1979-08-09|
    FR2416884B1|1984-08-17|
    CA1121092A|1982-03-30|
    ZA786897B|1980-07-30|
    GB2014144A|1979-08-22|
    IN154811B|1984-12-15|
    SE7900980L|1979-08-09|
    US4173476A|1979-11-06|
    JPS6326105B2|1988-05-27|
    DE2954646C2|1991-01-24|
    AR223168A1|1981-07-31|
    SE446862B|1986-10-13|
    BE874004A|1979-08-07|
    BR7900747A|1979-08-28|
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    US05/876,114|US4173476A|1978-02-08|1978-02-08|Complex salt photoinitiator|
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